Used extensively in baking, heat treatment/drying of semiconductor wafers, liquid crystals, disks and other components and devices requiring clean air conditions.

In addition to the standard instrumentation which offers two-step programming, the M-instrumentation allows programmed operation in up to 18 steps.

Class 100 cleanliness is achieved by employing a HEPA filter and a back-to-front laminar circulation system.

The high-performance model (PVHC model) provides stable performance even during heat-up or cooling at high temperatures of 150°C(+302°F) or more.

Compatible with the chamber network, E-BUS system.

odel	Power supply	Temperature range	Inside dimensions W x H x D mm (in)
PVC-211	200V AC 33W 50/60Hz	+60°C(+108°F) above room temp to +200°C(+392°F)	580 x 530 x 580 (22.8 x 20.9 x 22.8)
PVC-231			580 x 1130 x 580 (22.8 x 44.5 x 22.8)
PVC-331			800 x 1130 x 750 (31.5 x 44.5 x 29.5)
PVHC-211		+60°C(+108°F) above room temp to +350°C(+662°F)	580 x 530 x 580 (22.8 x 20.9 x 22.8)
PVHC-231			580 x 1130 x 580 (22.8 x 44.5 x 22.8)
PVHC-331			800 x 1130 x 750 (31.5 x 44.5 x 29.5)
PVHC-231MS		+60°C(+108°F) above room temp to +300°C(+572°F)	580 x 1130 x 530 (22.8 x 44.5 x 20.9)
PVHC-331MS			800 x 1130 x 700 (31.5 x 44.5 x 27.6)